This was from Rich Tiberio working at the Nanocenter. He is leaving soon for Japan and needs some substrates with thin oxide or Nitride.
If anyone has a few 75 or 100 mm substrates with measured thin oxide films to spare you can leave it on James Conway's desk or drop off to Rich directly.
Thank you,
James Conway
Typically at JEOL we expose ZEP on bare silicon and then go right into the SEM.
However Mike Rooks shows me much nicer images after a shallow etch.
Process
1) 3 inch or 4 inch wafers with thin ~ 15 to 20 nm of silicon dioxide or silicon nitride
2) spin ZEP resist
3) expose and develop
Extra step ) Light RIE to transfer into “hard mask” <<< JEOL skips this and goes directly to SEM,
4) SEM. Resist is OK, but hard mask doesn't’t melt.
I apologize for the short notice, I had given up, but last night I though “go for it”.
Conclusion:
Any generic 3 inch or 4 inch wafer with thin ~ 15 to 20 nm of silicon dioxide or silicon nitride would be great.
I can image everyone asks for “ some wafer you happen to have on the shelf”.
Thanks for your time.
Rich Tiberio
desk: 650 724 4691
cell: 408 476 6855
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